Hiden HPR30 Process Gas Analyser

For the examination of all the components present
in your chamber or evolved from your system
 

• CVD / PECVD / RIE / LPCVD / MOCVD
• Vacuum Coating / Plasma Etching
• Sputter Deposition
• Contamination Studies
• Base Pressure Fingerprint
• Leak Detection / Virtual Leaks / desorption
• Outgassing / Bakeout / Pump Performance
• Chamber / Process gas contaminants

 

The HPR-30 process gas analysis system is a compact gas analysis system for monitoring residual gases and vacuum processes, featuring:

 

• Compact bench-top / mobile cart / console rack construction.
• Direct re-entrant orifice with differential pumping for optimum sensitivity / response.
• Continuous sampling from 1 mbar to 10^-4 mbar.
• High Sensitivity (to 5 ppb), mass range options to 1000 amu.
• Soft Ionisation for the analysis of complex organics / appearance MS studies.
• Stability (less than ±0.5% height variation over 24 h).
• MASsoft control via RS232, RS485 or Ethernet LAN.
• Pneumatic valve control for automatic operation with manual override and fail-safe isolator in case of power failure or overpressure.
• Automated simultaneous data acquisition / analysis with local display alarm panels.

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