HPR80 Quantitative Gas Analyser for Reactive / Corrosive Species

Rapid, quantitative analysis of reactive / corrosive mixtures in your chamber / produced in your process

• Plasma / Reactive ion Etch Studies
• CVD / PVD / MOCVD
• Semiconductor wafer-fab studies
• Vacuum / Plasma Processing
• Quantitative analysis of reactive species
• HF, HCl, HBr, and CFC processes studies

 

Hiden HPR-80, a specifically designed system for high performance corrosive gas analysis and monitoring for semiconductor and vacuum processes, featuring:

 

• Heated Electro-polished heated flexible bellows, quick coupling port connector.
• Purged, inert viscous flow QIC calibration inlet for quantitative analyses.
• High Sensitivity (to 5 ppb), Mass to 2500 amu.
• 1 mTorr to Atmosphere sampling pressure operation.
• Capacitance manometer for species independent pressure monitoring.
• Stability (less than ±0.5% height variation over 24 h).
• MASsoft control via RS232, RS485 or Ethernet LAN.
• Matrix Inversion, Normalisation and Single Peak Referencing.

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